Linewidth roughness in nanowire-mask-based graphene nanoribbons
G. Xu, C.M. Torres, Jr., J. Bai, J. Tang, T. Yu, Y. Huang, X. Duan, Y. Zhang, and K.L. Wang
Appl. Phys. Lett. 98, 243118 (2011)
We present the analysis of linewidth roughness (LWR) in nanowire-mask-based graphene nanoribbons (GNRs) and evaluate its impact on the device performance. The data show that the LWR amplitude decreases with the GNR width, possibly due to the etching undercut near the edge of a nanowire-mask. We further discuss the large variation in GNR devices in the presence of LWR by analyzing the measured transport properties and on/off ratios.